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Our management team has over 200 publications in
both materials science applications and theoretical studies.
Each of the team members is both nationally and
internationally acclaimed has presented at conferences
worldwide.
Visit the links to the left to view
publications, presentations, and patents of the management
team.
(Technical
presentations have the presenting author underlined. Where
presentations have resulted in proceedings or reviewed journal
articles, the presentation and publication are listed together
under the year of the publication)
Publications
and Presentations 1995-1997
(presentation with proceedings) J.
M. McKinley, K.A. Richardson, F.B. Hagedorn, W.F. Cashion,
“Characterization of candidate bonding glasses for composite
IR window structures,” SPIE 2554 13-14 July 1995 San
Diego, p. 213.
(presentation
with proceedings) K.A. Richardson, J.M. McKinley,
A.G. Clare, A. Ott, “Progress towards improving glass
grindability: a glass chemistry approach,” Optical and
Fabrication Testing Technical Digest, Vol. 7, 1996.
(thesis)
J.M. McKinley, “The role of lead in the structure,
properties, and CNC machining for lead silicate glasses,”
University of
Central Florida,
1996.
Presentations, publications, patents 1998
(publication)
K.A. Cerqua-Richardson, J.M. McKinley, B. Lawrence, S. Joshi,
A. Villeneuve, “Comparison of nonlinear optical properties of
sulfide glasses in bulk and thin film form,” Optical
Materials 10 (1998) 155-159.
(presentation)
J.M. McKinley, T. Neil, C. Granger, L. Wu, J.J. Lee, M.
Decker, D. Sieloff, and F.A. Stevie, “Depth profiling of
ultra-shallow B implants using a Cameca IMS-6f: measurements
based on optimization calculations,” 11th annual
SIMS workshop, Austin, TX, May 1998.
(poster
presentation) J.M. McKinley, F.A. Stevie, C.N
Granger, D. Renard, “Analysis of alkali elements in insulators
using a Cameca IMS-6f,” 11th annual SIMS workshop,
Austin, TX, May
1998.
(poster
presentation) D. Zhou, F.A. Stevie, J.M. McKinley,
H. Gnaser, “SIMS study of nitrogen incorporated
nanocrystalline diamond thin film grown from N2/CH4
microwave plasmas,” 11th annual SIMS workshop,
Austin, TX, May 1998.
(patent)
F.A. Stevie, J.M. McKinley, “Analysis of alkali elements in
insulators using secondary ion mass spectrometry,” filed
August 19, 1998 in U.S. Patent and Trademark Office. Patent
Number 6229141 granted May 8, 2001.
(presentation
with proceedings) H.H. Vuong, C.S. Rafferty, J.
Ning, J.R. McMacken, J.M. McKinley, F.A. Stevie, “Modeling the
trapping and de-trapping of phosphorous at the Si to SiO2
interface,” SISPAD conference, Belgium, 1998.
(poster
presentation and publication) F.A. Stevie, R.G.
Wilson, J.M. McKinley, C. J. Hitzman, “Multiple element ion
implants for metal contamination analysis in semiconductor
technology,” Proceedings of the Eleventh International
Conference on Secondary Ion Mass Spectrometry, Orlando,
Florida, 1997, Eds. Gillen, Lareau, Bennett, and Stevie, John
Wiley and Sons, 1998, p.983.
(poster
presentation and publication) F.A. Stevie, D.S. Simons,
J. M. McKinley, J. McMacken, R. Santiesteban, P. Flatch,
J. Becerro, “Dose calibration of ion implanters for
semiconductor production,” Proceedings of the Eleventh
International Conference on Secondary Ion Mass Spectrometry,
Orlando, Florida, 1997, Eds. Gillen, Lareau, Bennett, and
Stevie, John Wiley and Sons, 1998, p.1007.
(poster
presentation and publication) S. Chaudhry, Y. F. Chyan,
F.A. Stevie, J. M. McKinley, y. Ma, H.M. Vaidya, K.H. Lee,
“Simulator calibration using SIMS for optimum device design of
high energy implanted CMOS and BiCMOS Processes,”
Proceedings of the Eleventh International Conference on
Secondary Ion Mass Spectrometry, Orlando, Florida, 1997,
Eds. Gillen, Lareau, Bennett, and Stevie, John Wiley and Sons,
1998, p.1043.
Presentations, publications, patents 1999
(publication) H. H. Vuong, H. J-
Gossmann, L. Pelaz, G.K. Celler, D.C. Jacobson, J. M.
McKinley, F.A. Stevie, C.N. Granger, D. Barr, J. Hergenrother,
D. Monroe, V.C. Venezia, C.S. rafferty, S. J. Hillenius,
“Boron pileup and clustering in silicon-on-insulator
films,”Applied Physics Letters, 75 (1999) p. 1083.
(presentation)
H. H. Vuong, H. J- Gossmann, L. Pelaz, G.K. Celler,
D.C. Jacobson, J. M. McKinley, F.A. Stevie, C.N. Granger, D.
Barr, J. Hergenrother, D. Monroe, V.C. Venezia, C.S. Rafferty,
S. J. Hillenius, “Observations and modeling of Boron pile-up
at the buried-oxide interface and boron clustering effects in
silicon-on-insulator,” MRS Rpint Meeintg, San Francisco, April
1999.
(patent)
Y. Ma, J. M. McKinley, F. A. Stevie, “Method for making
nitrided oxide layer and devices including same,” filed May
20, 1999 in U.S. Patent and Trademark Office.
(presentation
with proceedings) I.C. Kizilyalli, J.R. Radosevich,
S. Merchant, P.K. Roy, J. M. McKinley, S. Kuehne, J. Bevk, R.
Ashton, R. Singh, H. Vaidya, R. Kohler, B. Bocian, R. Freyman,
“A WSi/WSiN/poly-Si gate CMOS technology for low voltage DSPs,”
VLSI Syposium, 1999.
(presentation)
J. M. McKinley, F.A. Stevie, C. N. Granger, “Insulator
analysis in the semiconductor industry using a magnetic sector
SIMS,” 12th annual SIMS workshop, Gaithersburg, MD,
April 1999.
(poster
presentation with proceedings) K.K. Harris, F.A.
Stevie, J. M. McKinley, S.M. Merchant, M. Oh, “SIMS study of
copper quantification and diffusion in silicon, silicon
dioxide, and silicon nitride,” Proceedings of Advanced
Metallization Conference, Orlando, Florida, September 1999.
(publication)
D. Zhou, F.A. Stevie, L. Chow, J. M.. McKinley, H. Gnaser, V.H.
Desai, “Nitrogen incorporation and trace element analysis of
naocystalline diamond thin films by secondary ion mass
spectrometry,” J. Vac. Sci. Technol. A 17 (1999) 1135.
Presentations, publications, patents 2000
(poster
presentation and publication)
Papers from the Fifth
International Workshop on the Measurement, Characterization,
and Modeling of Ultra-Shallow Doping Profiles in
Semiconductors: J. M. McKinley, F.A Stevie, T.
Neil, J.J. Lee, L. Wu, and D. Sieloff, “Depth profiling of
ultra-shallow implants using a Cameca IMS 6f,” J. Vac. Sci.
Technol. B 18 (2000) 514.
(presentation
and publication)
Papers from the Fifth International Workshop on the
Measurement, Characterization, and Modeling of Ultra-Shallow
Doping Profiles in Semiconductors: H.-H.
Vuong, C.S. Rafferty, S.A. Eshraghi, J. Ning, J.R.
McMacken, S. Chaudhry, J. McKinley, and F.A. Stevie, “Dopant
loss at the Si-SiO2 interface,” J. Vac. Sci.
Technol. B 18 (2000) 428.
(publication)
J.M. McKinley, F.A. Stevie, C.N. Granger, and D. Renard,
“Analysis of alkali elements in insulators using a CAMECA IMS
6f,” J. Vac. Sci. Technol. A 18 (2000) 273.
(presentation)
F.A. Stevie, J.M. McKinley, K. Harris, C.N. Granger,
and L.E. Seagraves, “Sample for electron beam detection and
alignment,” 13th annual SIMS Workshop, Lake Tahoe,
NV, May 2000.
(presentation)
L.A. Giannuzzi, B. W. Kempshall, B. I. Prenitzer, J.M.
McKinley, and F.A. Stevie, “A multidisciplinary approach to
the understanding of ion induced sputter roughening,” 13th
annual SIMS Workshop, Lake Tahoe, NV, May 2000.
(presentation)
J. M. McKinley, F.A. Stevie, C.N. Granger, and L.E.
Seagraves, “Analysis of varying dose implant standards of P,
F, and B in SiO2 for quantification of highly-doped
oxides,” 13th annual SIMS Workshop, Lake Tahoe, NV,
May 2000.
(presentation)
D.F. Reich, B.W. Schueler, F.A. Stevie, J. M. McKinley,
C.N. Granger, R. Brigham, A. Li-Fatou, P.M. Lindly, J. Metz,
I. Mowat, T. Schuerlein, S. Smith, and M.H. Yang, “Surface
metal standards produced by ion implantation through a
removable layer,” 13th annual SIMS Workshop, Lake
Tahoe, NV, May 2000.
(poster
presentation) J.M. McKinley, F.A. Stevie, and C.N.
Granger, “Line scan quantification of metal-implanted Si
samples,” 13th annual SIMS Workshop, Lake Tahoe,
NV, May 2000.
(presentation
and publication) B. I. Prenitzer, L.A. Giannuzzi,
B. W. Kempshall, J.M. McKinley, F.A. Stevie, “Microstructural
evaluation of SIMS Crater roughening,” Proceedings of the
Twelfth International Conference on Secondary Ion Mass
Spectrometry, Brussels, Belgium 1999, Eds. A. Benninghoven, P.
Bertrand, H. N. Migeon, H. W. Werner, Elsevier, 2000, p. 77.
(presentation and publication) J. M.
McKinley, F.A. Stevie, C.N. Granger, “Analysis of low-k
dielectrics using a magnetic sector SIMS instrument,”
Proceedings of the Twelfth International Conference on
Secondary Ion Mass Spectrometry, Brussels, Belgium 1999,
Eds. A. Benninghoven, P. Bertrand, H. N. Migeon, H. W. Werner,
Elsevier, 2000, p. 607.
(presentation
and publication) D.F. Reich, B.W. Schueler, F.A.
Stevie, and C.N. Granger, “ToF-SIMS analysis of surface metal
standards produced by ion implantation through a removable
layer,” Proceedings of the Twelfth International Conference
on Secondary Ion Mass Spectrometry, Brussels, Belgium
1999, Eds. A. Benninghoven, P. Bertrand, H. N. Migeon, H. W.
Werner, Elsevier, 2000, p. 425.
(patent)
C. N. Granger, K.Harris, L. Seagraves, J. M McKinley, F. A.
Stevie, “Copper in SiO2 for Electron Beam Impact,”
filed March 16, 2000 in U.S. Patent
and Trademark Office.
(presentation)
F. A. Stevie, J. M. McKinley, C. N. Granger, F. Hillion,
D.S. Simons, P. Chi, B. Schueler, C. B. Vartuli, T. L. Shofner,
L.A. Gianuzzi, “Quantitative Surface Analysis Using Ion
Implantation,” AVS Annual Symposium, Boston, October 2000.
(presentation
with proceedings) P.H. Chi, D.S. Simons, J. M.
McKinley, F.A. Stevie, “High Precision Measurements of Arsenic
Implantation Dose in Silicon by Secondary Ion Mass
Spectrometry,” ULSI Conference, NIST, June 2000.
(presentation
with proceedings) C. B. Vartuli, F.A. Stevie, L.A.
Gianuzzi, B.M. Purcell, R.B.Irwin, J.M. McKinley, R.J. Wesson,
“Calibration Method for Elemental Quantification,” Microscopy
and Microanalysis, Philadelphia, August 2000.
(presentation
with proceedings) C.B. Vartuli, F.A. Stevie, D.
Wollman, M. Antonell, R.B. Irwin, J.M. McKinley, T.L. Shofner,
B.M. Purcell, S.A. Anderson, and B. To, “Comparison of
Elemental Detection Using Microcalorimetry, SIMS, AES, EDS, (SEM,
STEM, TEM),” Microscopy and Microanalysis, Philadelphia,
August 2000.
(presentation
with proceedings) K.K. Harris, F.A. Stevie, J. M.
McKinley, S.M. Merchant, M. Oh, “SIMS study of copper
quantification and diffusion in silicon, silicon dioxide, and
silicon nitride,” Conference Proceedings ULSI XV, 2000.
Presentations, publications, patents 2001
(patent)
Chetlur, et.al “Method of Creating D2/Hw Reservoirs
at Interfaces to Improve Device Reliability,” filed June
2001 in
U.S. Patent and Trademark Office.
(presentation
with proceedings)
T.L. Shofner, F.A. Stevie, J. M. McKinley, J. Lomness, “Water Vapor Enhancement for
Elemental Analysis Using Focused Ion Beam Secondary Ion Mass
Spectrometry (FIB-SIMS),” 27th
International Symposium for Testing and Failure Analysis
(ISTFA), Santa Clara, CA, November 2001.
(presentation)
J. M. McKinley, C.N. Granger, F.A. Stevie, R. Santiesteban, R. Roberts,
“Analytical Techniques for the Characterization of Ion Implant
Tools,” East Coast Ion Implant Users Group, Orlando, FL, April
2001.
(presentation)
D. Cappe,
E. Hirsch,
J.M. McKinley, F.A. Stevie, “Back-side Polishing Preparation
for SIMS,” 14th annual SIMS Workshop, Phoenix, AZ, May
2001.
(presentation
with proceedings)
A.T. Fiory,
K.K. Bourdelle, Y. Chen, Y. Ma, J.M. McKinley, P.K. Roy, K.H.
Weng, “Implant and Anneal Methods for PMOS Gates,” 199th
Meeting of the Electrochemical Society (ECS), Washington,
D.C., March 2001.
(presentation
with proceedings)
C.B. Vartuli,
F.A. Stevie, B. M. Purcell, A. Schwitter, B. Rossie, S. Brown,
T.L. Shofner, S.D. Anderson, J. M. McKinley, and R. B. Irwin,
“Energy Dispersive Spectrometry Calibration of Fe and Co,”
Microscopy and Microanalysis Anneal Meeting 2001, Long Beach,
CA, August 2001.
Presentations,
publications, patents 2002
(presentation
with proceedings) B.W. Schueler, C. N. Granger, L.
McCaig, J. M. McKinley, J. Metz, I. Mowat, D.F. Reich, S.
Smith, F.A. Stevie, M.H. Yang, “Surface Metal Standards
Produced by Ion Implantation through a Removable Layer,” SIMS
international conference, Japan, Sept 2001. (Proceedings to be
published in 2002).
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